Paper
1 November 1991 Optical and electrical properties of Al-Al2O3-Cu tunnel junctions
Q. Q. Shu, X. M. Tian, X. Y. Chen, C. Z. Cai, K. Q. Zheng, W. G. Ma
Author Affiliations +
Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47226
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China
Abstract
Compared with Al-Al2O3-Au tunnel junctions, light emission output and I-V characteristics of Al-Al2O3-Cu tunnel junctions have been studied. The junctions with Cu films of 500 angstrom can be biased up to 2.9 eV at room temperature, and the light emission efficiencies were in the 10-6 range. The I-V curves have been measured at 77 K. Based on the dispersion curves of surface plasmon polariton at the interfaces and the barrier parameters of the junctions, a discussion of the results is given.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Q. Q. Shu, X. M. Tian, X. Y. Chen, C. Z. Cai, K. Q. Zheng, and W. G. Ma "Optical and electrical properties of Al-Al2O3-Cu tunnel junctions", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); https://doi.org/10.1117/12.47226
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KEYWORDS
Copper

Interfaces

Aluminum

Dispersion

Physics

Electrons

Surface plasmon polaritons

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