1 November 1991 Preferential growth in ion-beam-enhanced deposition of Ti(C,N) films
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Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47221
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China
Abstract
As known to us, titanium nitride film formed by ion plating has been applied for decoration and hard coating in industry for years, but there still were many investigations on growing titanium nitride film by ion beam enhanced deposition in the past decade because of its benefit in cold processing and improved adhesion. There were also a few papers dealing with synthesis of titanium carbide by this technique. Ti(C,N) films are various solid solutions of titanium nitride and titanium carbide. They would incorporate the advantages of both and have attracted much attention. During a study of ion beam enhanced deposition of such films, a number of XRD patterns have been collected. This paper is a summary of these and its aim is to explain the formation mechanism in respect to orientation configuration of synthesized polycrystalline films. As various Ti(C,N) films have the same F.C.C. crystal structure of NaCl type as for TiN and TiC, the preferential orientations, which would be reflected in XRD, are only <111>, <100>, and <110> in spite of possible small peak shift due to composition change between that of TiC and TiN. We shall emphasize peak components and their relative intensity in the XRD patterns.
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You Shan Chen, You Shan Chen, Yi Lin Sun, Yi Lin Sun, Fu Min Zhang, Fu Min Zhang, Hai Chuan Mou, Hai Chuan Mou, "Preferential growth in ion-beam-enhanced deposition of Ti(C,N) films", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); doi: 10.1117/12.47221; https://doi.org/10.1117/12.47221
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