1 November 1991 Preparation of PbTiO3 thin film by dc single-target magnetron sputtering
Author Affiliations +
Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991); doi: 10.1117/12.47277
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China
Abstract
This paper describes the preparation of PbTiO3 thin film by DC single-target magnetron reactive sputtering, which hasn't yet been reported. After many experiments, the best Pb/Te area ratio of the target has been found under a specified sputtering condition. The samples obtained are heat-treated to 600 degree(s)C and the x-ray diffraction patterns are observed. The authors have succeeded in preparing almost transparent and light yellow perovskite-type PbTiO3 with resistivity of 107(Omega) cm.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bangchao Yang, Ju Yong Wang, Yu Ming Jia, Yongjie Huang, "Preparation of PbTiO3 thin film by dc single-target magnetron sputtering", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); doi: 10.1117/12.47277; https://doi.org/10.1117/12.47277
PROCEEDINGS
4 PAGES


SHARE
KEYWORDS
Sputter deposition

Thin films

Lead

Semiconducting wafers

Dielectrics

Heat treatments

Electrodes

Back to Top