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1 November 1991 Research of Cr2O3 thin film deposited by arc discharge plasma deposition as heat-radiation absorbent in electric vacuum devices
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Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47262
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China
Abstract
Formation of chrome oxide thin film on an iron substrate by arc discharge plasma as a heat- radiation absorbent in electric vacuum devices is described. Only oxygen as reaction gas without argon is applied in the discharge chamber and an improved film with good properties is obtained.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hong Deng, Xiang Dong Wang, and Lei Yuan "Research of Cr2O3 thin film deposited by arc discharge plasma deposition as heat-radiation absorbent in electric vacuum devices", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); https://doi.org/10.1117/12.47262
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