1 November 1991 Simulation of local layer-thickness deviation on multilayer diffraction
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Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47215
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China
Abstract
Recent investigation on multilayer films with a local layer-thickness deviation has been performed. This kind of deviation may occur at any position in the multilayer. Simulated example of W/C, W/Si, and Pd/Si multilayers for CuK(alpha) and CuL(alpha) diffractions with different layer parameters as well as various amounts of the local deviations show quite different behaviors. The results show that the diffraction profile for a local deviation A' equals A+ (Delta) d or B' equals B+ (Delta) d is nearly antisymmetric to that for A' equals A- (Delta) d or B' equals B- (Delta) d and the appearance of double peaks is affected by both of the position and amount of the local deviation. Explanation has been carried out by the amplitude-phase diagrams.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Y. P. Guo, X. C. He, S. V. Redko, Z. Q. Wu, "Simulation of local layer-thickness deviation on multilayer diffraction", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); doi: 10.1117/12.47215; https://doi.org/10.1117/12.47215
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