1 November 1991 Soft X-UV silver silicon multilayer mirrors
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Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47258
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China
Abstract
In the soft x-ray domain (near 10 nm), the reported optical constants of silver and silicon are sufficiently different to make them attractive for a multilayer design. In this paper, design and fabrication of silver/silicon multilayer to be used as normal-incidence reflectors for 11.4 nm radiation are presented. Characterization of these multilayer structures was accomplished using Auger electron spectroscopy (AES) and little-angle x-ray diffraction (LXD). As a result of our experiments, we came to realize that silver/silicon multilayer can provide high quality structures and reach a certain reflectance.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jian-Da Shao, Jian-Da Shao, Zhengxiu Fan, Zhengxiu Fan, Yong Hong Guo, Yong Hong Guo, Lei Jin, Lei Jin, "Soft X-UV silver silicon multilayer mirrors", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); doi: 10.1117/12.47258; https://doi.org/10.1117/12.47258
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