1 November 1991 Structure of very thin metal film
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Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47271
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China
Abstract
The modified point-ion model has been successfully used to calculated multilayer relaxation on metal surfaces. This model uses a single parameter (alpha) to simulate the unhomogeneous electron density distribution in a semi-infinite metal although its value should fit experimental data for a given material. This model was only used to calculate the semi-infinite metal before, however, it could be applicable for calculating the structure of the thin film consisting of very few atomic layers. As far as our knowledge goes, neither theoretical nor experimental data has been reported in this respect. In this paper, we use this model to calculate preliminarily the thin film structure of some fcc and bcc surfaces.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yongjie Huang, Ping Jiang, "Structure of very thin metal film", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); doi: 10.1117/12.47271; https://doi.org/10.1117/12.47271
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