1 December 1991 Reflective optical designs for soft x-ray projection lithography
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Abstract
All-reflective, unobscured optical designs were developed to help identify a candidate first- generation system to be used in soft x-ray projection lithography. The resolution goal for all designs was 0.1 micrometers , or better, at a design wavelength of 13 nm. Different design aspects including usable field size, image distortion, number of mirrors, telecentricity, surface shape (spherical versus aspheric), and system packaging were explored. Trade-off studied between systems requiring scanning and full-format nonscanning systems were made. The tolerance sensitivity analysis for a representative design demonstrated that as-built performance will be driven by the mirror surface irregularity tolerance; the required tolerance levels are briefly discussed.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tanya E. Jewell, Kevin P. Thompson, and J. Michael Rodgers "Reflective optical designs for soft x-ray projection lithography", Proc. SPIE 1527, Current Developments in Optical Design and Optical Engineering, (1 December 1991); doi: 10.1117/12.48683; https://doi.org/10.1117/12.48683
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