Fundamental studies of chemical-vapor-deposition diamond growth processes

Robert W. Shaw; William B. Whitten; J. Michael Ramsey; Lee Heatherly

doi:10.1117/12.48289

1 December 1991 Fundamental studies of chemical-vapor-deposition diamond growth processes

Robert W. Shaw, William B. Whitten, J. Michael Ramsey, Lee Heatherly

Proceedings Volume 1534, Diamond Optics IV; (1991) https://doi.org/10.1117/12.48289
Event: San Diego, '91, 1991, San Diego, CA, United States

Abstract

Laser spectroscopic techniques to foster a fundamental understanding of diamond film growth by hot filament chemical vapor deposition (CVD) are being developed. Several spectroscopic techniques are under investigation to identify intermediate species present in the bulk reactor volume, the thin active volume immediately above the growing film, and the actual growing surface. Such a comprehensive examination of the overall deposition process is necessary because a combination of gas phase and surface chemistry is probably operating. Resonantly enhanced multiphoton ionization (REMPI) techniques have been emphasized. A growth reactor that permits through-the-substrate gas sampling for REMPI/time-of-flight mass spectroscopy has been developed.

Citation Download Citation

Robert W. Shaw, William B. Whitten, J. Michael Ramsey, and Lee Heatherly "Fundamental studies of chemical-vapor-deposition diamond growth processes", Proc. SPIE 1534, Diamond Optics IV, (1 December 1991); https://doi.org/10.1117/12.48289

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