Microwave plasma deposition of polycrystalline diamond is investigated over the pressure range 1 to 100 kPa. The conditions of growth, microstructure, and spectroscopic properties of the resulting materials are compared. A phenomenological description of the dependence of diamond microstructure upon growth conditions is developed.
Alan B. Harker,
Jeffrey F. DeNatale,
"Pressure effects in the microwave plasma growth of polycrystalline diamond", Proc. SPIE 1534, Diamond Optics IV, (1 December 1991); doi: 10.1117/12.48274; https://doi.org/10.1117/12.48274