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1 December 1991 Smooth diamond films by reactive ion-beam polishing
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Abstract
Recent progress in ion beam polishing has successfully led to the production of smooth diamond films. By means of an oxygen ion beam, a 5 cm diameter, 1 micrometers rough film grown by microwave plasma chemical vapor deposition on silicon has been polished. The polished film root-mean-square and peak-to-valley roughness values averaged over 15 points are respectively 5.5 nm and 55.4 nm. Scattering has been decreased to the point where the polished film is transparent at wavelengths above the silicon absorption edge and shows interference fringes. This suggests that diamond films polished by this process can be used in optical applications. This paper describes the polishing technique and presents the results obtained by surface profilometry of the polished sample. The main advantages of ion beam polishing over other existing methods lie in the fact that it is noncontact and low-temperature technique.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bertrand G. Bovard, Tianji Zhao, and H. Angus Macleod "Smooth diamond films by reactive ion-beam polishing", Proc. SPIE 1534, Diamond Optics IV, (1 December 1991); https://doi.org/10.1117/12.48295
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