1 October 1991 Novel method to fabricate corrugation for distributed-feedback lasers using a grating photomask
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Abstract
A novel method is developed to fabricate varied line-space corrugations to improve the characteristics of distributed feedback (DFB) semiconductor lasers. Mechanically ruled grating patterns are transferred photolithographically to the surface of a semiconductor substrate by a contact mask aliner using the ultraviolet radiation of a He-Cd laser as a light source. The resultant varied line-space corrugation, like (lambda) /4-shift and corrugation-pitch modulation, improves the characteristics of distributed feedback lasers
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Makoto O. Okai, Tatsuo Harada, "Novel method to fabricate corrugation for distributed-feedback lasers using a grating photomask", Proc. SPIE 1545, International Conference on the Application and Theory of Periodic Structures, (1 October 1991); doi: 10.1117/12.49419; https://doi.org/10.1117/12.49419
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KEYWORDS
Photomasks

Diffraction gratings

Chromium

Helium cadmium lasers

Modulation

Light sources

Ultraviolet radiation

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