Paper
1 January 1992 Reflectivity measurements of Ni/V, Ni/Ti, and W/C multilayer mirrors in the 2-6nm wavelength region using synchrotron radiation
Hiroshi Nagata, Yukinobu Ishino, Shoji Seki, Masataka Shin'ogi, Tsuneaki Miyahara
Author Affiliations +
Abstract
Recent progress in the fields of physical vapor deposition (PVD), coupled with increased interest in the soft x-ray region of the electromagnetic spectrum, has driven the development of layered synthetic microstructures (LSMs) to the point that useful nongrazing incidence optics based on this technology are used in a variety of applications (e.g., solar astronomy, soft x-ray microscopy, and plasma spectroscopy). Our goal, as a production facility for thin film devices, was to demonstrate the capability for surement at 0.154 nm (CuK(alpha) ).
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hiroshi Nagata, Yukinobu Ishino, Shoji Seki, Masataka Shin'ogi, and Tsuneaki Miyahara "Reflectivity measurements of Ni/V, Ni/Ti, and W/C multilayer mirrors in the 2-6nm wavelength region using synchrotron radiation", Proc. SPIE 1546, Multilayer and Grazing Incidence X-Ray/EUV Optics, (1 January 1992); https://doi.org/10.1117/12.51217
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KEYWORDS
Reflectivity

Multilayers

Mirrors

Absorption

Spectral resolution

X-rays

Argon

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