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1 January 1992 Experimental study of Fe/C multilayer performance: effects of substrate quality and of x-ray irradiation
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Fe/C multilayers were rf-sputtered on two silicon substrates with substantial difference of surface quality. Microroughness and figure were measured for each substrate before and after layer deposition by using a scanning tunnelling microscope, an optical microscope interferometer, and a Fizeau interferometer. Although the optical quality of both substrates is better than that of current wafers, differences of x-ray reflectivity and peak shape are still observed. The better sample was exposed to an x-ray wiggler beam of 4.6 keV critical energy, so that the multilayer surface received a power density of 5W/mm2 during a 4 hour period, the sample being cooled from the backside. The reflection properties of the sample before and after x ray exposure are compared. At first glance we did not see any significant changes in reflectivity or bandpass, which is very promising for the use of multilayers on high-power synchrotron x-ray beamlines.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eric Ziegler, M. Krisch, L. Vasquez, Jean Susini, Pierre Boher, and Philippe Houdy "Experimental study of Fe/C multilayer performance: effects of substrate quality and of x-ray irradiation", Proc. SPIE 1547, Multilayer Optics for Advanced X-Ray Applications, (1 January 1992);


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