1 January 1992 Fabrication of advanced x-ray optics with magnetron minisource arrays
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Proceedings Volume 1547, Multilayer Optics for Advanced X-Ray Applications; (1992); doi: 10.1117/12.51266
Event: San Diego, '91, 1991, San Diego, CA, United States
Abstract
A process for direct application of multilayered coatings to large area (180 cm2) planar or curved optical surfaces has been developed. Small diameter (2.54 cm) sputter sources are appropriately configured in an array for the deposition of multilayered coatings on virtually any optical surface. Potential application in soft x-ray projection lithography is examined for the deposition of Mo/Si multilayers with a uniform, 6.5 - 7 nm, layer pair spacing onto 15.2 cm diameter silicon wafers. Layer pair spacing variations less than 1.5%, over surface areas exceeding 120 cm2, are measured using Cu (Kappa) (alpha) grazing incidence diffraction.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alan F. Jankowski, R. J. Foreman, Daniel M. Makowiecki, "Fabrication of advanced x-ray optics with magnetron minisource arrays", Proc. SPIE 1547, Multilayer Optics for Advanced X-Ray Applications, (1 January 1992); doi: 10.1117/12.51266; https://doi.org/10.1117/12.51266
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KEYWORDS
Multilayers

Silicon

X-ray optics

Molybdenum

Optical coatings

Semiconducting wafers

X-rays

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