1 January 1992 Soft x-ray projection lithography system design and cost analysis
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Abstract
A baseline design and wafer cost analysis for a soft x-ray projection lithography (SXPL) system are presented. The design study provides an overview of the likely form and structure of a SXPL prototype. The wafer cost analysis provides an assessment of the relative importance of different cost factors in the SXPL system.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Natale M. Ceglio, Natale M. Ceglio, Andrew M. Hawryluk, Andrew M. Hawryluk, } "Soft x-ray projection lithography system design and cost analysis", Proc. SPIE 1547, Multilayer Optics for Advanced X-Ray Applications, (1 January 1992); doi: 10.1117/12.51272; https://doi.org/10.1117/12.51272
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