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1 January 1992 Upgraded facility for multilayer mirror characterization at NIST
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Abstract
In response to the needs of the emerging field of normal incidence soft x-ray optics, a field with applications ranging from extreme ultraviolet (XUV) solar imaging to x-ray lithography, the National Institute of Standards and Technology (NIST) has initiated an XUV multilayer and optical substrate characterization program. In this paper, we give an overview of the present capabilities of the NIST facility and discuss some of the proposed improvements, concentrating on the new soft x-ray reflectometry facility being built at SURF.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Richard N. Watts, David L. Ederer, Richard D. Deslattes Jr., Thomas B. Lucatorto, William Tyler Estler, Christopher J. Evans, and Theodore V. Vorburger "Upgraded facility for multilayer mirror characterization at NIST", Proc. SPIE 1547, Multilayer Optics for Advanced X-Ray Applications, (1 January 1992); https://doi.org/10.1117/12.51284
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