1 December 1991 Photoelastic investigation of statics, kinetics, and dynamics of crack formation in transparent models and natural structural elements
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Abstract
Calculation techniques determining crack-resistance parameters, finite element techniques among them, can not still provide a full-scale solution of problems emerging in design of crack-resistance structures. Of increasing value therefore become development and improvement of experimental methods, in particular, of photoelasticity method for determining crack resistance parameters on models of polymer birefringent materials and also on natural materials using birefringent coatings.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
B. I. Taratorin, V. N. Sakharov, O. U. Komlev, V. N. Stcherbakov, A. V. Starchevsky, "Photoelastic investigation of statics, kinetics, and dynamics of crack formation in transparent models and natural structural elements", Proc. SPIE 1554, Second International Conference on Photomechanics and Speckle Metrology, (1 December 1991); doi: 10.1117/12.49566; https://doi.org/10.1117/12.49566
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