1 February 1992 Application of a 2-D atomic force microscope system to metrology
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Abstract
This paper describes a 2-D atomic force microprobe (AFM) system designed specifically for accurate submicron critical dimension (CD) metrology. The system includes 2-D AFM sensing, 3-D position interferometry with 1.25 nm sensitivity, and a special tip design. Unlike conventional AFM scanning systems, the system operates like a nanorobot moving from point to point under computer control and sensing surfaces without making contact. The system design, operating characteristics, and application to metrology are
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Diana Nyyssonen, Diana Nyyssonen, Laszlo Landstein, Laszlo Landstein, E. Coombs, E. Coombs, } "Application of a 2-D atomic force microscope system to metrology", Proc. SPIE 1556, Scanning Microscopy Instrumentation, (1 February 1992); doi: 10.1117/12.134902; https://doi.org/10.1117/12.134902
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