Photo-induced adhesion changes: a technique for patterning lightguide structures

H. G. Festl; Hilmar Franke

doi:10.1117/12.50690

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1 December 1991 Photo-induced adhesion changes: a technique for patterning lightguide structures

H. G. Festl; Hilmar Franke

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Proceedings Volume 1559, Photopolymer Device Physics, Chemistry, and Applications II; (1991) https://doi.org/10.1117/12.50690
Event: San Diego, '91, 1991, San Diego, CA, United States

Abstract

A two-step procedure is described where a photosensitive layer of doped PMMA is spin- coated on a glass substrate, exposed to a UV pattern, and, finally, covered in a second spin- coating procedure. The result is a thickness pattern that follows the UV image. The obtained waveguides are characterized with respect to their effective indices as a function of UV exposure and spinning speed. Simple elements like lenses or beam splitters are discussed.

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H. G. Festl and Hilmar Franke "Photo-induced adhesion changes: a technique for patterning lightguide structures", Proc. SPIE 1559, Photopolymer Device Physics, Chemistry, and Applications II, (1 December 1991); https://doi.org/10.1117/12.50690

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