1 October 1991 Fabrication of phase structures with continuous and multilevel profile for diffraction optics
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Proceedings Volume 1574, Intl Colloquium on Diffractive Optical Elements; (1991) https://doi.org/10.1117/12.50129
Event: International Colloquium on Diffractive Optical Elements, 1991, Szklarska Poreba, Poland
Abstract
This paper presents the investigation results of a new photolithographic fabrication method of highly effective diffractive optical elements (DOE). The method, unlike the well-known multilevel one, does not require a set of masks prepared and aligned. It is demonstrated that the application of half-tone image binarization technique allows one to fabricate a DOE with continuous phase profile and high diffractive efficiency, which can be achieved with a single raster mask and an optical projection system of a photolithography setup used as low-pass spatial filter. Using the algorithm of pulse-width modulation experimental samples of DOE aberration correctors and kinoform lens array with the numerical aperture NA equals 0.1 were fabricated. The diffraction efficiency of these elements, fabricated with conventional photolithography equipment, was more than 80%.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alexander G. Poleshchuk, "Fabrication of phase structures with continuous and multilevel profile for diffraction optics", Proc. SPIE 1574, Intl Colloquium on Diffractive Optical Elements, (1 October 1991); doi: 10.1117/12.50129; https://doi.org/10.1117/12.50129
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