1 October 1991 Ion treatment in technology of diffraction optical elements
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Proceedings Volume 1574, Intl Colloquium on Diffractive Optical Elements; (1991) https://doi.org/10.1117/12.50099
Event: International Colloquium on Diffractive Optical Elements, 1991, Szklarska Poreba, Poland
Abstract
Problems of ion treatment in diffraction optical elements (DOE) technology with ion beam and reactive ion beam systems are discussed. Etching is carried out with particular screening of ion beam on contact protecting masks, which are films of organic (light sensitivity composition on the novolac base) and inorganic (vacuum deposited films of Al, ZnS, Nd2O3, As-S) materials. DOE microstructure parameters and optical-technical characteristics of DOE produced on the surface of optical glasses (binary synthesized holograms, phase filters, phase modulating elements of kinoform type with high efficiency) are reported.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Natalia P. Shevchenko, K. D. Megorskaja, Irina N. Reshetnikova, "Ion treatment in technology of diffraction optical elements", Proc. SPIE 1574, Intl Colloquium on Diffractive Optical Elements, (1 October 1991); doi: 10.1117/12.50099; https://doi.org/10.1117/12.50099
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