1 October 1991 Planar diffractive optical elements prepared by electron-beam lithography
Author Affiliations +
Proceedings Volume 1574, Intl Colloquium on Diffractive Optical Elements; (1991) https://doi.org/10.1117/12.50102
Event: International Colloquium on Diffractive Optical Elements, 1991, Szklarska Poreba, Poland
Abstract
This paper presents results of research activities devoted to preparing optical diffraction elements for space waves by use of electron-beam lithography. It is shown that the orthogonal electron-beam drawing can increase irregularities and flaws. Relations between the zone area inaccuracy and properties of the relief binary phase transparent screens are described. From these relations, the demands for setting the necessary edge drawing quality of the electron beam exposition are derived.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Frantisek Urban, Frantisek Matejka, "Planar diffractive optical elements prepared by electron-beam lithography", Proc. SPIE 1574, Intl Colloquium on Diffractive Optical Elements, (1 October 1991); doi: 10.1117/12.50102; https://doi.org/10.1117/12.50102
PROCEEDINGS
8 PAGES


SHARE
Back to Top