Paper
1 March 1992 Oxygen precipitate mapping in silicon using micro-FTIR spectroscopy
Adele Sassella, Alessandro Borghesi
Author Affiliations +
Proceedings Volume 1575, 8th Intl Conf on Fourier Transform Spectroscopy; (1992) https://doi.org/10.1117/12.56472
Event: Eighth International Conference on Fourier Transform Spectroscopy, 1991, Lubeck-Travemunde, Germany
Abstract
We present a new high spatial resolution Fourier transform infrared technique which can detect low concentrations of SiO2 particles embedded in a silicon matrix. We use 30 micrometers diameter spots and scan the samples to obtain an optical response map of such precipitates.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Adele Sassella and Alessandro Borghesi "Oxygen precipitate mapping in silicon using micro-FTIR spectroscopy", Proc. SPIE 1575, 8th Intl Conf on Fourier Transform Spectroscopy, (1 March 1992); https://doi.org/10.1117/12.56472
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KEYWORDS
Oxygen

Silicon

Absorption

Spectroscopy

Particles

Semiconducting wafers

FT-IR spectroscopy

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