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1 December 1992 Processing issues and technologies for optoelectronics-integrated circuits and devices (invited)
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Abstract
The influence of processing on the design of optical devices and optoelectronic integrated circuits is discussed. Process compatibility of devices used as the basis of a complete optoelectronic integrated circuit will be discussed along with some potential optoelectronic integrated circuits employing only phase modulators and couplers. Specific examples of the application of reactive-ion-beam etching in the formation of passive optical waveguide phase modulators, optical interconnects, turning mirrors, and output couplers in GaAs/AlGaAs are given.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
G. Allen Vawter "Processing issues and technologies for optoelectronics-integrated circuits and devices (invited)", Proc. SPIE 1582, Integrated Optoelectronics for Communication and Processing, (1 December 1992); https://doi.org/10.1117/12.2321800
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