1 December 1991 Laser-induced etched grating on InP for integrated optical circuit elements
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Proceedings Volume 1583, Integrated Optical Circuits; (1991) https://doi.org/10.1117/12.50910
Event: OE Fiber, 1991, Boston, MA, United States
Abstract
Based on a non-linear coupling between the etchant species and the photo-induced carriers during photo-electrochemical etching of semiconductor surfaces, we propose that the reaction residue, the oxide layer, regulates the reaction.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Haim Grebel, P. Pien, "Laser-induced etched grating on InP for integrated optical circuit elements", Proc. SPIE 1583, Integrated Optical Circuits, (1 December 1991); doi: 10.1117/12.50910; https://doi.org/10.1117/12.50910
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