Reactive sputtering of Si/SiNx quarter-wave dielectric mirrors using in-situ laser reflectometry

Dubravko I. Babic; Thomas E. Reynolds; Evelyn L. Hu; John Edward Bowers

doi:10.1117/12.56925

1 February 1992 Reactive sputtering of Si/SiN_x quarter-wave dielectric mirrors using in-situ laser reflectometry

Dubravko I. Babic, Thomas E. Reynolds, Evelyn L. Hu, John Edward Bowers

Proceedings Volume 1593, Dry Etch Technology; (1992) https://doi.org/10.1117/12.56925
Event: Microelectronic Processing Integration, 1991, San Jose, CA, United States

Abstract

We demonstrate a computer automated system for reactive sputter deposition of silicon and silicon nitride that features a laser reflectometer as an in-situ monitoring tool. A hollow anode was designed specifically for this purpose and enables in-situ reflectivity measurements at normal incidence to the wafer. We describe the use of this system for in-situ determination of the deposition rate and the material optical properties (refraedve index and loss). Finally we describe the fabrication of high precision Si/SiNx quarter-wave dielectric mirrors for opto-electronic applications by means of an in-situ feedback control algorithm.

Citation Download Citation

Dubravko I. Babic, Thomas E. Reynolds, Evelyn L. Hu, and John Edward Bowers "Reactive sputtering of Si/SiN_x quarter-wave dielectric mirrors using in-situ laser reflectometry", Proc. SPIE 1593, Dry Etch Technology, (1 February 1992); https://doi.org/10.1117/12.56925

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