1 January 1992 Adaptive photolithography control using development time manipulation
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Proceedings Volume 1594, Process Module Metrology, Control and Clustering; (1992); doi: 10.1117/12.56642
Event: Microelectronic Processing Integration, 1991, San Jose, CA, United States
Abstract
A closed-loop adaptive control technique for photolithography is proposed and evaluated. In this strategy, development time is manipulated in order to keep the output critical dimension at a desired value, despite the disruptive effects of unmeasured process disturbances. The adaptive control strategy incorporates a three parameter reduced-order model of the photolithography process, a parameter estimator, and a nonlinear model-inversion controller. Simulation studies show that the adaptive controller is able to reject the detrimental effects of process disturbances and bring the critical dimension back to its desired value. In the simulations, PROLITH was used to represent the real lithography process.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert A. Soper, Duncan A. Mellichamp, Dale E. Seborg, "Adaptive photolithography control using development time manipulation", Proc. SPIE 1594, Process Module Metrology, Control and Clustering, (1 January 1992); doi: 10.1117/12.56642; http://dx.doi.org/10.1117/12.56642
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KEYWORDS
Process control

Optical lithography

Adaptive control

Process modeling

Control systems

Metrology

Systems modeling

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