1 January 1992 Application of optical emission diagnostics and control related to semiconductor processing
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Proceedings Volume 1594, Process Module Metrology, Control and Clustering; (1992); doi: 10.1117/12.56652
Event: Microelectronic Processing Integration, 1991, San Jose, CA, United States
Abstract
This paper will discuss and show applications of optical emission spectroscopy techniques and methods to monitor plasma emissions during semiconductor processing. A brief discussion of the instrumentation that was used and the software to control the instrumentation will also be presented. Optical emission spectroscopy techniques that will be discussed include chemical species identification in plasma etching, process fingerprinting, contamination detection, endpoint analysis/control and sputter/deposition plasma monitoring.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gregory Viloria, Richard N. Savage, "Application of optical emission diagnostics and control related to semiconductor processing", Proc. SPIE 1594, Process Module Metrology, Control and Clustering, (1 January 1992); doi: 10.1117/12.56652; http://dx.doi.org/10.1117/12.56652
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KEYWORDS
Plasma

Chemical species

Etching

Diagnostics

Process control

Emission spectroscopy

Semiconductor manufacturing

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