Paper
1 January 1992 Categories of process variables: robustness optimization, uniformity tuning, and mean adjustment
Sungdo Ha, Emanuel Sachs
Author Affiliations +
Proceedings Volume 1594, Process Module Metrology, Control and Clustering; (1992) https://doi.org/10.1117/12.56636
Event: Microelectronic Processing Integration, 1991, San Jose, CA, United States
Abstract
A new methodology for process optimization is introduced which has the goal of dividing process variables into three categories. Robustness factors are those used to render the process robust against disturbances. Tuning factors are those used to tune the uniformity of a batch. Adjustment factors are those used to adjust the mean of the batch. An objective function called a 3-step SN ratio is derived to enable the 3-step optimization. In the first step, a designed experiment is performed and the results are used to find the best tuning and adjustment factors and to set the levels of the robustness factors. In the second step, the tuning factor (or factors) is used to tune those aspects of the batch uniformity which can be tuned. In the third step, the adjustment factor is used to adjust the batch mean to the target The methodology is illustrated and demonstrated in application to single wafer plasma etching.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sungdo Ha and Emanuel Sachs "Categories of process variables: robustness optimization, uniformity tuning, and mean adjustment", Proc. SPIE 1594, Process Module Metrology, Control and Clustering, (1 January 1992); https://doi.org/10.1117/12.56636
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KEYWORDS
Etching

Process control

Semiconducting wafers

Plasma etching

Metrology

Plasma

Signal attenuation

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