1 January 1992 VLSI process expert diagnostic system
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Proceedings Volume 1594, Process Module Metrology, Control and Clustering; (1992); doi: 10.1117/12.56627
Event: Microelectronic Processing Integration, 1991, San Jose, CA, United States
Abstract
In a proposed process diagnostic system, a template correlation routine is used to identify the pattern produced on a wafer by bad die. The same pattern recognition routine can be applied to the pattern produced on the wafer from the result or different types of failure of the die. The overall wafer pattern, the individual test patterns, and electrical measurements made during final test form the input data to an expert system. In turn, the expert system uses heuristic algorithms that identify probable process problems, The template correlation routines have been successfully developed and implemented. Current efforts are dedicated to the knowledge engineering phase of the project. The expert system will, at first, identify defects to the process level. Future refinements will permit the diagnostic tool to identify the defect by name as well as process. Successful development and implementation of this system will save the labor of manual investigation of anomalous events in the fabrication of VLSI devices. Used in conjunction with statistical process control, this system should improve VLSI device yield.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael E. Parten, Robert F. Tyson, Atindra K. Mitra, Jerry Lovelace, "VLSI process expert diagnostic system", Proc. SPIE 1594, Process Module Metrology, Control and Clustering, (1 January 1992); doi: 10.1117/12.56627; http://dx.doi.org/10.1117/12.56627
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KEYWORDS
Semiconducting wafers

Process control

Diagnostics

Failure analysis

Very large scale integration

Composites

Photomasks

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