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1 January 1992 Application of optical emission diagnostics and control related to semiconductor processing
Gregory Viloria, Richard N. Savage
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Proceedings Volume 1594, Process Module Metrology, Control and Clustering; (1992) https://doi.org/10.1117/12.56652
Event: Microelectronic Processing Integration, 1991, San Jose, CA, United States
Abstract
This paper will discuss and show applications of optical emission spectroscopy techniques and methods to monitor plasma emissions during semiconductor processing. A brief discussion of the instrumentation that was used and the software to control the instrumentation will also be presented. Optical emission spectroscopy techniques that will be discussed include chemical species identification in plasma etching, process fingerprinting, contamination detection, endpoint analysis/control and sputter/deposition plasma monitoring.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Gregory Viloria and Richard N. Savage "Application of optical emission diagnostics and control related to semiconductor processing", Proc. SPIE 1594, Process Module Metrology, Control and Clustering, (1 January 1992); https://doi.org/10.1117/12.56652
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KEYWORDS
Plasma
Chemical species
Etching
Diagnostics
Process control
Emission spectroscopy
Semiconductor manufacturing
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