Paper
1 February 1992 Applications of surface charge analyzer for use in process control and in-line characterization of reoxidized nitrided oxide (ONO) films
James S. Cable, Chandra Kantamneni, Izak Bencuya
Author Affiliations +
Proceedings Volume 1595, Rapid Thermal and Integrated Processing; (1992) https://doi.org/10.1117/12.56664
Event: Microelectronic Processing Integration, 1991, San Jose, CA, United States
Abstract
We report in this work the application of the Surface Charge Analysis (SCA) technique for in-line process control and characterization of re-oxidized nitrided oxide (ONO) films processed by RiP. Film samples with a wide variety of processing conditions have been fabricated and characterized using the SCA technique. Following SCA characterization, electrodes were formed on the samples followed by detailed CV measurements. Finally, correlations between SCA and CV determined parameters were established. Since the SCA is an optical technique which is non-invasive and requires no electrode processing, and some degree of correlation was found between the two techniques, this suggests that the SCA warrants further investigation as a technique for in-line process control and characterization for RTP grown ONO films.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James S. Cable, Chandra Kantamneni, and Izak Bencuya "Applications of surface charge analyzer for use in process control and in-line characterization of reoxidized nitrided oxide (ONO) films", Proc. SPIE 1595, Rapid Thermal and Integrated Processing, (1 February 1992); https://doi.org/10.1117/12.56664
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KEYWORDS
Oxides

Process control

Electrodes

Ellipsometry

Interfaces

Silicon

Capacitors

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