1 February 1992 Influence of pyrometer signal absorption due to process gas on temperature control in rapid thermal processing
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Proceedings Volume 1595, Rapid Thermal and Integrated Processing; (1992) https://doi.org/10.1117/12.56660
Event: Microelectronic Processing Integration, 1991, San Jose, CA, United States
Abstract
Future DRAM devices require higher performance dielectrics for which novel process chemistries must be studied. Nitrous oxide (N20) has shown promising results as a process gas for rapid thermal oxidation. However, current practice in rapid thermal processing (RTP) has neglected the effect of process gas on temperature control. For N20, this results in a large temperature offset and oscillation, and poor thickness uniformity. Evidence is presented indicating that gas-phase absorption of the pyrometer signal produces the difficulties observed when using N20. These difficulties do not occur if the pyrometer is operated at a wavelength not absorbed by the N20. This behavior also does not occur when using 02 as the process gas since it is transparent at the pyrometer wavelengths used. The data shows that one must examine the absorption spectra of the process gas for compatibility with the pyrometer wavelength used for temperature measurements.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Julius C. Chang, Tue Nguyen, James S. Nakos, Josef W. Korejwa, "Influence of pyrometer signal absorption due to process gas on temperature control in rapid thermal processing", Proc. SPIE 1595, Rapid Thermal and Integrated Processing, (1 February 1992); doi: 10.1117/12.56660; https://doi.org/10.1117/12.56660
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