Paper
1 December 1991 Applications of excimer lasers in microelectronics
Chang Yu, Gurtej S. Sandhu, V. K. Mathews, Trung Tri Doan
Author Affiliations +
Proceedings Volume 1598, Lasers in Microelectronic Manufacturing; (1991) https://doi.org/10.1117/12.51043
Event: Microelectronic Processing Integration, 1991, San Jose, CA, United States
Abstract
Among the newly developed techniques for thin film processing and semiconductor device fabrication, the excimer laser is one of the most promising and powerful due to its usefulness for rapid thermal processing and surface microstructure modification. To date, its applications in microelectronics include deep UV lithography, metal deposition and reflow, process monitoring and diagnostics, laser repairing, and thin film processing including high temperature superconductor material synthesis and laser enhanced chemical vapor deposition (CVD). In this paper, the status of semiconductor device metallization using excimers laser will be reviewed, and recent development in texturization of polycrystalline silicon thin films, silicide formation, and maskless patterning using excimer lasers will be presented.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chang Yu, Gurtej S. Sandhu, V. K. Mathews, and Trung Tri Doan "Applications of excimer lasers in microelectronics", Proc. SPIE 1598, Lasers in Microelectronic Manufacturing, (1 December 1991); https://doi.org/10.1117/12.51043
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KEYWORDS
Excimer lasers

Laser processing

Metals

Laser applications

Silicon films

Thin films

Titanium

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