1 December 1991 IC rewiring by laser microchemistry
Author Affiliations +
Proceedings Volume 1598, Lasers in Microelectronic Manufacturing; (1991) https://doi.org/10.1117/12.51036
Event: Microelectronic Processing Integration, 1991, San Jose, CA, United States
Abstract
ICs interconnection networks can be locally modified using a tightly focused laser beam to induce chemical reactions on the circuit surface. Owing to the precursor used, conductors and insulators can either be etched or deposited within the laser spot. Bertin & Co. have recently developed a line of laser-assisted tools dedicated to VLSI prototypes rewiring. This paper summarizes the tests performed on various technology devices from major IC manufacturers: IBM, STM, and Texas Instruments. The different repair steps and results of the characterization tests are presented.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gerard Pelous, Gerard Pelous, Yves Guern, Yves Guern, D. Gobleid, D. Gobleid, J. David, J. David, A. Chion, A. Chion, Didier Tonneau, Didier Tonneau, } "IC rewiring by laser microchemistry", Proc. SPIE 1598, Lasers in Microelectronic Manufacturing, (1 December 1991); doi: 10.1117/12.51036; https://doi.org/10.1117/12.51036
PROCEEDINGS
10 PAGES


SHARE
RELATED CONTENT

Advanced PVD Ti/TiN liners for contact and via applications
Proceedings of SPIE (September 05 1997)
Laser Microchemistry : A Powerful Tool For VLSI
Proceedings of SPIE (October 11 1989)
Failure analysis for improved electromigration performance
Proceedings of SPIE (January 14 1993)
Laser-induced gold deposition for thin-film circuit repair
Proceedings of SPIE (December 01 1991)
Electromigration in VLSI metallization
Proceedings of SPIE (December 01 1991)

Back to Top