1 December 1991 IC rewiring by laser microchemistry
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Proceedings Volume 1598, Lasers in Microelectronic Manufacturing; (1991) https://doi.org/10.1117/12.51036
Event: Microelectronic Processing Integration, 1991, San Jose, CA, United States
ICs interconnection networks can be locally modified using a tightly focused laser beam to induce chemical reactions on the circuit surface. Owing to the precursor used, conductors and insulators can either be etched or deposited within the laser spot. Bertin & Co. have recently developed a line of laser-assisted tools dedicated to VLSI prototypes rewiring. This paper summarizes the tests performed on various technology devices from major IC manufacturers: IBM, STM, and Texas Instruments. The different repair steps and results of the characterization tests are presented.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gerard Pelous, Gerard Pelous, Yves Guern, Yves Guern, D. Gobleid, D. Gobleid, J. David, J. David, A. Chion, A. Chion, Didier Tonneau, Didier Tonneau, } "IC rewiring by laser microchemistry", Proc. SPIE 1598, Lasers in Microelectronic Manufacturing, (1 December 1991); doi: 10.1117/12.51036; https://doi.org/10.1117/12.51036


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