Holography in photoresist materials: 1991 update

Thomas J. Cvetkovich

doi:10.1117/12.57783

1 January 1992 Holography in photoresist materials: 1991 update

Thomas J. Cvetkovich

Proceedings Volume 1600, Intl Symp on Display Holography; (1992) https://doi.org/10.1117/12.57783
Event: International Symposium on Display Holography, 1991, Lake Forest, IL, United States

Abstract

Salient factors are discussed for the production of holograms in photoresist materials including; choosing and handling photoresist emulsions and establishing criteria for properly exposing and developing photoresist to produce high quality rainbow images. Comparisons are drawn with the more familiar silver halide emulsions and with microlithography where such comparisons are deemed helpful.

Citation Download Citation

Thomas J. Cvetkovich "Holography in photoresist materials: 1991 update", Proc. SPIE 1600, Intl Symp on Display Holography, (1 January 1992); https://doi.org/10.1117/12.57783

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