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1 January 1992 Issues associated with the commercialization of phase-shift masks
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Abstract
Issues associated with the commercialization of phase shift masks are discussed. Design layouts incorporating multiphase transitions and voting are presented along with methods of mask fabrication. Issues associated with mask inspection and repair are discussed, along with data on actual reticles produced using the prescribed method of manufacture. Cost of reticles in relation to potential wafer processing gains are compared along with problems associated with the increased complexity of the mask making process.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John L. Nistler, Greg P. Hughes, Andrew J. Muray, and James N. Wiley "Issues associated with the commercialization of phase-shift masks", Proc. SPIE 1604, 11th Annual BACUS Symposium on Photomask Technology, (1 January 1992); https://doi.org/10.1117/12.56947
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