1 January 1992 Zero-bias PBS process for 5X reticles
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Abstract
A set of experiments to identify a zero-bias PBS1 process for 5X reticles is described. Parameters such as electron-beam dose, developer strength, baking mode and development mode have been optimized for unbiased PBS reticles. Line edge quality and defect density data will be presented. No rough edges were detected when reticles were run on KLA 208 type machine with one pixel sensitivity (0.36 pm minimum defect size). Plate quality was characterized by Scanning Electron Microscopy (SEM), optical Critical Dimension (CD) and line-edge roughness measurement techniques using Leica Laser Measurement System (LMS 2000) and Etec MEBESIII. It appears that the proposed benefits of biased processes over unbiased ones, namely smoother edge quality and lower defect density, have been overcome by the improvements in the processes, the quality of the raw materials and cleanroom facilities and practices. Statistical data on these parameters will be presented.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Regine G. Tarascon-Auriol, Regine G. Tarascon-Auriol, Christophe Pierrat, Christophe Pierrat, Michael W. Stohl, Michael W. Stohl, Christopher P. Braun, Christopher P. Braun, James Burdorf, James Burdorf, Sheila Vaidya, Sheila Vaidya, } "Zero-bias PBS process for 5X reticles", Proc. SPIE 1604, 11th Annual BACUS Symposium on Photomask Technology, (1 January 1992); doi: 10.1117/12.56944; https://doi.org/10.1117/12.56944
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