1 February 1992 Site selection and design of a low-vibration building for submicron technology applications
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SGS-Thomson Microelectronics is currently building a new facility dedicated to submicron technologies. During the early stage of the project programming, various site surveys were conducted to ensure that the ambient vibration level of the selected site was compatible with the design of a low-vibration building. Once a site was selected, in-situ measurements and test foundations were used to analyze in real situations the propagation characteristics of the soil and the dynamic response of different types of foundations. These experiments provided the site background noise level, the soil damping coefficient and the transfer function between different contiguous foundation systems. Impact of future on-site road traffic was simulated and measured directly on the test foundation. Measurements were also carried out within existing facilities to practically collect vibration input levels at the support pad of mechanical systems like pumps, chillers and axial fans. All these measurements were used to adjust a numerical model predicting the dynamic behavior of the process floor under operational conditions. This paper presents the result of the various measurements carried out and describes the methodology used to finalize the structural design of the building and optimize the facility lay-out concept. Some results concerning the predicted value of the vibration velocity at the process-floor level are presented.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alain Brochet, Alain Brochet, Jean Bernard, Jean Bernard, } "Site selection and design of a low-vibration building for submicron technology applications", Proc. SPIE 1619, Vibration Control in Microelectronics, Optics, and Metrology, (1 February 1992); doi: 10.1117/12.56834; https://doi.org/10.1117/12.56834

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