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14 May 1992 LIF measurement of CH* radical state through chemical sputtering
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Abstract
The detection of CH* radicals was made by the laser induced fluorescence method. CH* radicals were formed through chemical sputtering processes of isotropic graphite targets irradiated by hydrogen ions in the low keV range and at temperatures around 700K. Fluorescent spectra of CH* radicals induced by a flashlamp pumped dye pulse laser were obtained by a photo-multiplier tube as a function of wavelength. The detailed structure of the chemical and electronic states of CH* radicals can be extracted from highly resolved fluorescent spectra.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Noriaki Asada, Masato Yasumoto, and Nagao Kamijo "LIF measurement of CH* radical state through chemical sputtering", Proc. SPIE 1636, Applied Spectroscopy in Materials Science II, (14 May 1992); https://doi.org/10.1117/12.59309
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