C-H dissociation rate constants of alkylbenzenes from hot molecule formed by 158-nm (F2 laser) irradiation

Nobuaki Nakashima; Tetsuya Shimada; Yuichi Ojima; Yasukazu Izawa; Chiyoe Yamanaka

doi:10.1117/12.58135

1 April 1992 C-H dissociation rate constants of alkylbenzenes from hot molecule formed by 158-nm (F₂ laser) irradiation

Nobuaki Nakashima, Tetsuya Shimada, Yuichi Ojima, Yasukazu Izawa, Chiyoe Yamanaka

Author Affiliations +

Proceedings Volume 1638, Optical Methods for Time- and State-Resolved Chemistry; (1992) https://doi.org/10.1117/12.58135
Event: OE/LASE '92, 1992, Los Angeles, CA, United States

Abstract

The C-H bond in the methyl group of toluene, p-xylene, and mesitylene dissociates to the corresponding radicals from the hot molecules with internal energy of 8 eV. The dissociation rate constants were measured by the method of nanosecond laser photolysis. These rate constants can be predicted by a statistical theory on the basis of those measured by 193 nm irradiation. The C-C bond in paracyclophane was found to dissociate by two photons at 193 nm.

Citation Download Citation

Nobuaki Nakashima, Tetsuya Shimada, Yuichi Ojima, Yasukazu Izawa, and Chiyoe Yamanaka "C-H dissociation rate constants of alkylbenzenes from hot molecule formed by 158-nm (F₂ laser) irradiation", Proc. SPIE 1638, Optical Methods for Time- and State-Resolved Chemistry, (1 April 1992); https://doi.org/10.1117/12.58135

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