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1 April 1992 Dynamics of S production in the 193-nm photodissociation of CH3SCH3, CH3SSCH3, CH3SH, and H2S
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Abstract
The production of S(3P, 1D, 1S) in the 193 nm photodissociation of CH3SCH3, CH3SSCH3, CH3SH, and H2S has been studied using 2 + 1 REMPI techniques. The 193 nm photodissociation cross sections of the radicals CH3S and HS initially formed in the photodissociation of CH3SCH3, CH3SSCH3, CH3SH, and H2S have been determined as 1 X 10-18 cm2 using a rate equation scheme. The dominant product from CH3S is S(1D), while that from SH is S(3P). The formation of S(3P) in the 1-photon (193 nm) photodissociation of CH3SSCH3 is also observed.
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Chung-Lin Liao, C.-W. Hsu, and Cheuk Yiu Ng "Dynamics of S production in the 193-nm photodissociation of CH3SCH3, CH3SSCH3, CH3SH, and H2S", Proc. SPIE 1638, Optical Methods for Time- and State-Resolved Chemistry, (1 April 1992); https://doi.org/10.1117/12.58141
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