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1 May 1992 Nanofabrication utilizing the atomic-force microscope
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Proceedings Volume 1639, Scanning Probe Microscopies; (1992)
Event: OE/LASE '92, 1992, Los Angeles, CA, United States
We describe a lithographic technique using atomic force microscopy (AFM) to expose commercially available photoresists in a controllable manner. In contrast to scanning tunneling microscopy lithography on photoresists, the AFM has the advantage of having better control of the contact force between the probe tip and sample and thus reduces the possibility of physical damage to the resist material during exposure. Using a metal coated cantilever, we have been able to create resist patterns at the nanometer-scale.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
L. A. Nagahara, Patrick Ian Oden, Arun Majumdar, J. P. Carrejo, J. Graham, and John Alexander "Nanofabrication utilizing the atomic-force microscope", Proc. SPIE 1639, Scanning Probe Microscopies, (1 May 1992);

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