13 August 1992 Evaluation of photolithographic processes for high-density optical disc mastering
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Proceedings Volume 1663, Optical Data Storage; (1992) https://doi.org/10.1117/12.137559
Event: Optical Data Storage Topical Meeting, 1992, San Jose, CA, United States
An investigation into the fundamental properties of the photolithographic optical disc mastering process is presented. It is shown that, despite the extreme differences in processing conditions, some of the models used in IC-lithography are valid for this process. This opens the possibility of introducing some of the techniques for resolution enhancement, proposed in IC-lithography, into the optical disc mastering process.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Paul L.M. Put, Paul L.M. Put, P. A. Kraakman, P. A. Kraakman, Robert D. Morton, Robert D. Morton, Jan H.T. Pasman, Jan H.T. Pasman, } "Evaluation of photolithographic processes for high-density optical disc mastering", Proc. SPIE 1663, Optical Data Storage, (13 August 1992); doi: 10.1117/12.137559; https://doi.org/10.1117/12.137559

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