1 May 1992 Modified multilevel phase kinoform for array generator
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Abstract
An optimal design of a modified type multilevel phase kinoform is presented. Both phase value in each kinoform cell and coordinates of transition points are used as variables of merit function in the optimization of the multilevel phase kinoform. The simulation results show that this multilevel phase kinoform has higher diffraction efficiency and lower relative error than that of others, in which only phase value in each cell is used as variables of merit function during the optimization. Some parameters which affect fabrication of kinoform are also analyzed.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Pin Long, Minxian Wu, K. Chin, Dahsiung Hsu, "Modified multilevel phase kinoform for array generator", Proc. SPIE 1667, Practical Holography VI, (1 May 1992); doi: 10.1117/12.59632; https://doi.org/10.1117/12.59632
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KEYWORDS
Diffraction

Etching

Computer generated holography

Diffraction gratings

Quantization

Holography

Optical design

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