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9 July 1992 Advanced e-beam systems for manufacturing
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Abstract
E-beam lithography systems are being employed as pattern generators in the semiconductor manufacturing process. The TV-like raster exposure of a scanning electron beam under computer control provides the resolution, flexibility, and accuracy needed for the generation of high density integrated circuit patterns. E-beam mask making has become the technology of choice, while e-beam direct writing on the wafer has remained largely a niche application. Here the throughput handicap of serial exposure presented an economic hurdle, which limited applications to exploratory research and prototyping rather than manufacturing--with few exceptions: IBM, for example, has applied its internally developed high-throughput EL-series systems worldwide in large scale manufacturing of ASIC-type bipolar logic products. The recent progress in state-of-the-art of manufacturing-oriented e-beam systems for mask making and direct writing, together with results achieved with these advanced systems, is the subject of this paper.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hans C. Pfeiffer "Advanced e-beam systems for manufacturing", Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992); https://doi.org/10.1117/12.136006
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