EB lithography for fabricating a GHz SAW filter on LiTaO3 substrate (Poster Paper)

Takeo Nagata; Masahiro Kobayashi; Kinjiro Kosemura; Masami Satoh; Moritoshi Ando; Toshihiko Miyashita; O. Ikata

doi:10.1117/12.136021

9 July 1992 EB lithography for fabricating a GHz SAW filter on LiTaO₃ substrate (Poster Paper)

Takeo Nagata, Masahiro Kobayashi, Kinjiro Kosemura, Masami Satoh, Moritoshi Ando, Toshihiko Miyashita, O. Ikata

Proceedings Volume 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II; (1992) https://doi.org/10.1117/12.136021
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

We fabricated 2.6 GHz surface acoustic wave (SAW) filters using an electron beam exposure system. The filter consists of an interdigital transducer of aluminum on piezoelectric material (LiTaO3). Since the LiTaO3 density was high, a large number of electrons were backscattered from the material when exposed by electron beams. When a conventional negative resist was used, the backscattered electrons degraded the image contrast so that resist residue remained on unexposed areas after development. The process margin, which indicates exposure tolerance, was calculated. The process margin was small for LiTaO3, indicating that it is difficult to suppress resist residue when negative resist is used and that a positive resist should be used. To obtain vertical walls of positive resist, we used a 0.4-micrometers double-layer configuration in which the upper layer had a lower sensitivity than the bottom layer. To prevent the piezoelectric substrate from breaking due to the pyroelectric effect, the resist pre- and post-baking temperature was raised gradually at a rate of 5 degrees/minute. The 0.4-micrometers line and space patterns required for a 2.6 GHz filter could be produced accurately. The fabricated SAW filter had a 2.58 GHz center frequency and an insertion loss of 5.0 dB.

Citation Download Citation

Takeo Nagata, Masahiro Kobayashi, Kinjiro Kosemura, Masami Satoh, Moritoshi Ando, Toshihiko Miyashita, and O. Ikata "EB lithography for fabricating a GHz SAW filter on LiTaO₃ substrate (Poster Paper)", Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992); https://doi.org/10.1117/12.136021

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
8 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Electron beams

Photoresist processing

Aluminum

Silicon

Acoustics

Lithography

Backscatter

Show All Keywords

Keywords/Phrases

Search In:

Publication Years