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9 July 1992 Effects of mounting imperfections on an x-ray lithography mask (Poster Paper)
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Kinematically-mounted x-ray lithography masks are investigated to determine their response to imperfections in mounting, namely, misalignment of the clamping forces. Given the limited error budget for x-ray mask mounting, it is essential to minimize the mechanical distortions in the exposure area. Three-dimensional finite element models of the support ring, mask wafer and membrane are used to analyze the gravitational effects for both horizontal mounting (e- beam patterning) and vertical mounting (synchrotron exposure) coupled with the effects of misaligned clamping forces. In-plane distortions of the membrane are computed and the nodal displacements in the patterned area are uniquely mapped. Results of this study show the resultant membrane distortions due to imperfect mounting to be significant when considering 0.25 micrometers (or finer) technology.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Daniel L. Laird and Roxann L. Engelstad "Effects of mounting imperfections on an x-ray lithography mask (Poster Paper)", Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992);

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