9 July 1992 Optimization of partially coherent illumination in x-ray lithography (Poster Paper)
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Abstract
Based on the simplified yet accurate model we developed, a route to an optimized x-ray lithography system is defined. It predicts a large exposure window with a less coherent illumination than those currently used in most synchrotron radiation based exposure systems. Two different schemes of coherence reduction are proposed and their effects are simulated.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Franco Cerrina, Franco Cerrina, Jerry Z.Y. Guo, Jerry Z.Y. Guo, } "Optimization of partially coherent illumination in x-ray lithography (Poster Paper)", Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992); doi: 10.1117/12.136046; https://doi.org/10.1117/12.136046
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