Optimization of partially coherent illumination in x-ray lithography (Poster Paper)

Franco Cerrina; Jerry Z.Y. Guo

doi:10.1117/12.136046

9 July 1992 Optimization of partially coherent illumination in x-ray lithography (Poster Paper)

Franco Cerrina; Jerry Z.Y. Guo

Author Affiliations +

Proceedings Volume 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II; (1992) https://doi.org/10.1117/12.136046
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

Based on the simplified yet accurate model we developed, a route to an optimized x-ray lithography system is defined. It predicts a large exposure window with a less coherent illumination than those currently used in most synchrotron radiation based exposure systems. Two different schemes of coherence reduction are proposed and their effects are simulated.

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Franco Cerrina, Franco Cerrina, Jerry Z.Y. Guo, Jerry Z.Y. Guo, } "Optimization of partially coherent illumination in x-ray lithography (Poster Paper)", Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992); doi: 10.1117/12.136046; https://doi.org/10.1117/12.136046

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